ICP-MS for the materials economy.
Battery cells, semiconductor wafers, and electroplating lines all live or die on parts-per-billion contamination. The instrument scope that lets us screen vitamins also resolves cathode-precursor stoichiometry and trace lead in copper plating chemistry.
Published. Per-test.
No quote calls.
Every assay a la carte, every panel bundled. Bulk discount at 5+ samples. Prices below reflect a single-compound submission.
Major-element stoichiometry + impurity scan for one cathode-precursor or active-material lot. Built for pilot-line and gigafactory QC labs.
- Major elements (Li / Co / Ni / Mn / Fe)
- Impurity scan (Cu, Zn, Cr, Pb, Al, Si)
- Anion screen (SO₄, Cl)
- Stoichiometry vs cell-grade spec
- Production COA
Per-lot bath composition + organic-additive titration + impurity check. SLA pricing for daily / weekly QC across multiple plating lines.
- Major-element titration
- Organic additive consumption
- Anion (SO₄ / Cl / PO₄)
- Trace impurity screen
- SLA pricing at 20+ lots / month
Ultra-trace metal scan for semiconductor process chemicals, photoresists, slurries, and ultra-pure water. SEMI-aligned panel.
- ppb / ppt LOD
- ICP-MS direct injection
- Pre-cleaned PFA bottles supplied
- SEMI / ASTM method alignment
- Method-blank QC included
Where industrial materials lots fail QC.
Trace contamination defines the spec for battery-grade and electronics-grade inputs. We benchmark against the failure modes that cost cell capacity, plating yield, and wafer rework.
RoHS, REACH, USP, SEMI, IPC — the spec your buyer reads.
Industrial materials testing is contract-driven. Every COA we sign maps to the standard your buyer references in the PO.
Restriction of Hazardous Substances in electrical and electronic equipment: Pb 1,000 ppm, Cd 100 ppm, Hg 1,000 ppm, Cr(VI) 1,000 ppm, plus four phthalates and PBB / PBDE. Our ICP-MS panel reports against the homogenous-material limits with XRF screening for production-line throughput.
Candidate-list SVHC reporting against the current EU SVHC list. Targeted heavy-metal and phthalate screens, with subcontracted GC-MS work for organic SVHC analytes.
SEMI standards for process-chemical purity in semiconductor manufacturing. Trace-metal limits in the ppb / ppt range for sulfuric acid, hydrogen peroxide, hydrofluoric acid, and ultra-pure water.
Industry standard for solder alloy specification, composition tolerances, and impurity limits. Our ICP-OES panel reports against the alloy table for SAC, SnPb, and Pb-free formulations.
When the industrial material is destined for pharmaceutical or medical-device manufacturing (drug-device combination products, implantable hardware), USP elemental-impurity limits override the industrial spec. We report against both bases on the COA.
Yes. Our ICP-MS / ICP-OES bench handles cathode-precursor stoichiometry (NMC, NCA, LFP, LMFP, LMR) plus impurity-scan QC at production cadence. We can structure SLA pricing tied to volume — typical pilot-line clients run 10–40 lots per week. Volume agreements unlock 24-hour priority and dedicated batch turnaround.